溅射系统 meaning in English
sputtering system
Examples
- Research of unbalanced magnetron sputtering system
非平衡磁控溅射系统的研究 - In the paper , the two - step approach , in which the deposition procedure was divided into two sections by decrease the substrate temperature or the bias voltage , was used in order to synthesize c - bn film by the conventional js - 450a rf system . the influence of process parameters for nucleation and growth of depositing c - bn was studied separately
本论文使用传统的js - 450a射频溅射系统利用两步法（降温降偏压法）沉积立方氮化硼薄膜，分别研究了各工艺参数对立方氮化硼成核和生长的影响。 - The c - bn thin films were deposited on si substrates using the conventional radio - frequency ( rf ) sputtering system . the c - bn / si thin film heterojunctions have been fabricated with doping into n - type ( p - type ) semiconductor by implanting s ( be ) ions into them . i - v curves of bn / si heterojunctions were obtained by the high resistance meter , c - v curves of bn / si heterojunctions were obtained by the c - v meter
使用rf射频溅射系统,在si衬底上沉积氮化硼薄膜,用离子注入的方法在制备好的bn薄膜中分别注入s和be ,成功的制备了bn / sin - p和bn / sip - p薄膜异质结,用高阻仪测得bn薄膜表面电阻率和bn / si薄膜异质结的i - v曲线,用c - v仪测得bn / si薄膜异质结的c - v曲线。 - Combined with special wettability properties , a - c films may have greater potential applications . in present thesis , a series of a - c films were prepared by magnetron sputtering technique on substrates as si ( 100 ) and glass , and the deposited processes were controlled to adjust the morphology of the surfaces of a - c films . to further obtain the desired wettability , surface chemistry compound of the lotus - like surfaces were plasma modified by optimized processes
本文采用磁控溅射系统在普通玻璃和单晶硅上获得了具有不同表面形貌特征的非晶碳薄膜,此外利用等离子体表面处理系统,通过改进工艺方法,优化工艺条件,对非晶碳薄膜表面化学组成进行调控,获得了润湿性能从超亲水到超疏水范围变化的表面。