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渗氢 meaning in English

hydrogen charging

Examples

  1. Behavior of hydrogen permeation in zn - ni alloy electrodeposition
    合金电沉积过程中的渗氢行为
  2. The oxide film of zirconium on the sdses conceals its high hydrogen permeability because of its self passive effect with oxygcn , which limits its application as high h - permse1ective membran
    1几个纳米厚的氧化锆膜掩盖了其本体的渗氢性能,使其在作为高选择渗氢膜的应用上受到限制。
  3. However , the lcf of r specimen containing - 200 g / g hydrogen is better than that of the hydrided t specimen , and shows slightly superior to unhydrided r specimen , whereas the hydrided t specimen has not the apparent difference as compared with t specimen
    与室温下未渗氢态试样相比,渗氢后r向试样的低周疲劳性能稍稍优于未渗氢态r向试样,但对t向zr一4合金试样,渗氢对其室温低周疲劳性能几乎没有影响。
  4. The prepared sdse modified zirconum meinbrane was tested at the wider range of tcmperaure and pressure and differellt composihons of hydrogen mixturc gases ( i . e . different hydrgen panal pressure ) in order to examine the performance of this membrane and the sole hpermselechvity of the membrane . the results showed tha the purity of the permeated hydrgen is l00 % at the base of the detection greatest lower lanit of the qhle mass spectrometer , and there was no impurity gas passed , the permeating flux and permeability of this membrane are from several decades times to one decade times more higher than tha of a palladum membran in the range of from 593k to 773k , puv = 0 . 2 ~ 0 . 3mpa , pdn = 4x l04pa - - 0 . lmpa , the hydrogen permeatng flux is increased with the difference of the squto root of pressure , and presents a linear relationship , the pressure seems has no influence on the permeablity , the permeabi1ity is decreased with the increasing of the temperature , and presents an exponential relationship , accondng to the fitting curve of the relationship betwen the permeability and the temperatur derived from the experimenta daa , in the range of 593k ~ 773k , pup0 . 2 ~ 0 . 3mpa , pha = 4 x l0 # pa ~ 0
    在更宽的温度范围、压差范围内,在不同原料气组成(即不同的氢气分压)条件下,对所制备的锆表面改性膜进行了渗氢性能实验,考核了膜对氢的唯一选择渗透性,结果表明:在四极质谱的检测下限内,只有氢气存在,而无杂质气体通过;在593k 773k温度范围内,锆表面改性选择渗氢膜具有高于钯膜数十倍至十几倍的渗氢流量和渗氢系数;其渗氢流量随着膜两侧氢分压平方根摘要差的增大而增大,并且呈线性关系;压力对膜的渗氢系数几乎无影响;膜的渗氢系数随着温度的升高而下降,井巨呈指数关系:根据对实验数据所作渗氢系数与温度关系曲线的拟合,在温度593k 773k范围内,压差p 、 0二0
  5. The zircondri filin wtut rirconia wa prepared and the removing technology of the zirconia on the zirconium sdrices was obtalned . the methods of chemistry and magnetron sputtring plating were used in order to platc a palladium film , which is characteristic of self catalysis for hydrogen and the sole h - permselectivity on the clean rirconium sdrices prepared by the methods of electrochemitw and ( or ) high temperatur vacuum hydrgenization , which was firstly studied . the plating tedrilogy was obained and the surface modified zirconium membran was prepared
    在利用电化学法和真空高温除氧加氢法去除了锆表面氧化膜的基础上,分别采用化学法、磁控溅射法两种镀膜技术在其表面上镀上了一层对氢具有自催化分解、唯一选择渗透性的金属钯膜,首次获得了锆基材膜表面上镀钯的制备工艺,成功制备了锆表面改性选择渗氢膜。
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Related Words

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