气相淀积 meaning in English
gas deposition
gas plating
vapor deposition
Examples
- The higher value is comparable to those obtained in cvd epitaxy .
这个高的数值可以和从化学气相淀积外延得到的数值相比拟。 - Particulates can emanate from process equipment (e.g., in cvd and etch reactors)as well as from humans (from street clothes, skin flakes, etc. )
尘粒也能由工艺设备（如化学气相淀积和刻蚀反应器）以及工作人员（身穿的外套，体表的皮屑等）而产生。 - In contrast to the cvd process, mbe does not require the extensive safety precautions, although solid arsenic dopant must be handled carefully .
和化学气相淀积工艺相反，虽然在操作中对于固体砷还是必须非常小心掌握，但是，分子束外延不需要庞大的安定保险装置。 - Generic specification of low pressure chemical vapor deposition system
低压化学气相淀积设备通用技术条件 - Chemical vapour deposition
和化学气相淀积