曝光设备 meaning in English

exposure sources

Excimer laser processing equipment for wafer stepper
准分子激光缩小投影曝光设备用
08 . 03 practice for operating xenon arc - type exposure apparatus with water for exposure of photodegradable plastics
光降解塑料曝射用带水氙弧光型曝光设备操作惯例
As the ic manufacturing process develops from sub - micron to very deep submicron ( vdsm ) technologies , with current lithography tools ( 248nm and 193nm ) , foundries can not manufacture products that designs want because of so - called optical proximity effect ( ope )
当集成电路生产工艺发展到纳米级时，利用现有的曝光设备( 248nm和193nm ) ，由于所谓的光学邻近效应，集成电路制造厂商已经无法制造出满足电路功能要求的产品。