干法刻蚀 meaning in English
dry etch
Examples
- Dry etching of molybdenum film in fabrication of thin film transistor liquid crystal display
液晶阵列工艺中金属钼的干法刻蚀研究 - We use wet etching and rie to fabricate the awg device with tir mirrors respectively
采用湿法腐蚀和干法刻蚀两种工艺分别制作出了全内反射型awg器件。 - Plasma etching has been widely used in the etching process of si devices . now the study is focused on the microfabrication of compound semiconductor
等离子体干法刻蚀在硅器件的微细加工中已经得到广泛应用，目前研究的焦点集中在化合物半导体。 - When the output power of the rf is within 500w and the reflection power is within 10w , a good matching effect can be gained . insb - in material in the icp etching system is etched by chc1f2 plasma . through the sem analysis of the etching result , it can be observed that the sidewall is smooth , flat and anisotropic
在自制的icp干法刻蚀系统中用chclf _ 2等离子体对insb - in材料实现了干法刻蚀，通过对刻蚀样品的sem分析，观察到刻蚀后的侧壁光滑平整，有良好的各向异性。 - This thesis work has researched the fabrication technics of photonic crystal defect waveguide with air - bridge structure and collecting waveguide ; suggested using uv - lithography and wet etching to fabricate traditional waveguide , after that , using eb - lithography and dry etching to fabricate photonic crystal holes , so can reduce the fabrication cost by a big range ; designed the moulding board , which can fabricate the air - bridge structure and is convenient for recognizing position in eb - lithography ; the structure consisted of traditional waveguides and etching grooves are fabricated on soi successfully , then an successful eb - lithography is realized on the structure , the defect waveguide collected with the traditional waveguide quite well ; used the etching grooves to do the sacrificial layer etching experiment , which grounded etching sacrificial layer by photonic crystal holes in next step
提出采用紫外光刻工艺制作传统波导结构之后，通过电子束曝光和干法刻蚀制作光子晶体小孔的工艺方案，大幅度减低了制作成本；设计出可形成空气桥结构、并且适用于电子束曝光位置识别的光刻模板，在soi材料上成功制作出带有空气桥刻蚀预留槽以及接续光波导的结构，在该结构上成功实现了光子晶体带隙波导的电子束曝光，带隙波导与接续光波导位置接续良好；最后利用预留槽进行了刻蚀牺牲层的实验，为下一步利用光子晶体小孔刻蚀牺牲层形成空气桥结构打下了基础。