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基距 meaning in English

basal spur

Examples

  1. The optimal technological parameters of smco thin films were determined as 60mm distance between the target and the substrate , sow sputtering power and 1 . 1 pa ar pressure through thorgonal experiments
    通过正交试验法得到了实验条件下镀制smco薄膜最佳的工艺参数:靶-基距6cm 、功率80w 、 ar气压强1 . 1pa 。
  2. The relationship between spectrum and preparation conditions were studied in this paper . the results are listed as following . the transmission of ultrathin aluminum films increase evidently , when the working pressure arise . with the increase of sputtering time , the transmission of ultrathin aluminum films decrease linear
    然后利用双光束分光光度计测定了其透光率,研究了透光性能与各制备条件之间的关系,发现,随着工作气压、基片温度、靶基距的增大,薄膜的透光率有不同程度的增大;但透光率随着溅射时间的增加而呈近线性下降。
  3. It was concluded that , the structure of zno thin films were influenced by many working parameters such as substrate temperature , sputtering pressure , the distance between target and substrate and so on . meanwhile , the deposition rate of zno thin films was varied at different working parameters
    结果表明,对于zno薄膜,薄膜的择优取向性与衬底温度、溅射气压、靶基距等工艺参数有很大关系,而与氩氧比例的大小无明显的关系;而且在不同工艺参数条件下,薄膜的沉积速率也呈规律性变化。
  4. It was discovered through the experiment that , the structure and deposition rate of aln thin films varied with the varieties of substrate temperature , sputtering power , distance between target and substrate . xps spectra of aln thin film showed that al atoms and n atoms in the sample were schomichemetry . it was concluded through the afm spectra of aln thin films that surface morphology and roughness were widely varied with different thickness of the films
    通过对aln薄膜的研究发现,衬底温度、溅射功率、靶基距对aln薄膜的择优取向性和沉积速率的影响很大; aln薄膜样品的xps分析表明,薄膜中al和n基本上为理想配比;而且从aln薄膜样品的afm图中可以看出,不同厚度的薄膜的表面形貌和粗糙度有很大不同。
  5. Moreover , it was found that the microstructure and physical properties of dlc film were affected to some extent by the distance between target and substrate . when the distance between target and substrate increases , sp 3c content in the deposited dlc film decreases . accordingly , the value of surface roughness , microhardness , friction coefficient , residual stress and band gap became lower in the same way
    此外,靶基距对dlc薄膜的结构和性能也有一定的影响,随着靶基距增加, dlc薄膜中的sp ~ 3c含量减少, dlc薄膜的表面粗糙度降低,显微硬度降低,摩擦系数减小,残余应力减小,光学带隙eg减小。
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Related Words

  1. 基矩阵
  2. 基具
  3. 基距比
  4. 基俊
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