刻蚀时间 meaning in English
etch period
etching time
Examples
- In the fabrication of diffractive optics elements and semiconductor , it is demonstrated that an initial edger can expand into smooth curves and the surface motion in different local place is not identical
在制作衍射光学元件以及半导体加工的刻蚀工艺中，刻蚀产生的表面面形随刻蚀时间的延长而产生动态的形变。 - The oxidizing parameters of the anodization in the following experiments were preferred on the basis of measuring the dependence of pl properties ( peak position , and max intensity , etc . ) on anodization conditions , such as the anodizing current density , the time of the anodization , the concentration of the solution ( mainly of hf ) , and on the doping level of the substrate
刻蚀时间、刻蚀液配比及衬底电阻率对pl发光强度、峰值波长等性质的影响。在此基础上优化出制备多孔硅的具体参数。对不掺sb与掺sb的snci 。 - In the section of fabricating technology , i first discuss the ion beam technology . through the analysis of the effects of each parameter on the surface smoothness , profile fidelity and linewidth resolution in the process of ion etching , the suitable angle of incident ion beam , ion energy , density of ion beam and time of etching are selected combining the actual status of the mask
在制作工艺的研究方面，首先研究了离子束刻蚀技术，通过对离子束刻蚀过程中各个参数对刻蚀元件的表面光洁度、轮廓保真度和线宽分辨的影响分析，结合掩膜的实际情况选择出了合适的离子束入射角、离子能量、束流密度和刻蚀时间等参数。