光蚀刻 meaning in English
optical lithogrpahy
photoetching
Examples
- Why not use photolithography to make nanostructures
为什麽不使用光蚀刻法制造奈米结构？ - Various technical improvements have made it possible to push the limits of photolithography
各种技术若能改进，便可推进光蚀刻法的极限。 - Photolithography then reduces the size of the pattern in a process analogous to that used in a photographic darkroom [ see illustration on opposite page ]
接著，光蚀刻法用一种类似照相暗房中进行的过程（见右页图） ，把图案的尺寸缩小。 - The photolithographic tools that will be used to make chips with features well below 100 nanometers will each cost tens to hundreds of millions of dollars
要在晶片上做出小于100奈米的图案细节，所需的光蚀刻工具每件要花上几千万到几亿美元。 - Because these forms of radiation have much shorter wavelengths than the ultraviolet light currently used in photolithography , they minimize the blurring caused by diffraction
由于这类型辐射的波长远较现在光蚀刻使用的紫外光来得短，因此可以减少因绕射而造成的模糊。