光刻极限 meaning in English
photolithography limitation
Examples
- Interferometirc lithographic technology incorporates laser , interference optics , diffraction optics and optical lithography and it is a frontier research subject in microfabrication technology and microelectronic field sponserd by national natural science foundation of china . the research for this technology in theory , simulation and experiments has important scientific meanings and broad application prospect for promoting lithographic limit , developing nanometer electronic and photoelectron devices , novel large screen panel display and novel lithographic equipment of our country
干涉光刻技术集激光、干涉和衍射光学及光学光刻于一体，是国家自然科学基金资助的微细加工技术和微电子领域的前沿研究课题，对其进行理论、模拟和实验研究，对推进光学光刻极限，发展我国纳米微电子和光电子器件、新型大屏幕平板显示器和新型光刻机具有重要的科学意义和广阔的应用前景。